Dataset: Evolution and suppression of spin cycloid in epitaxial BiFeO3 thin films

Authors: Maya Ramesh ¹, Xinyan Li ^2,3, S.K. Ojha², Sajid Husain ^4,5, Xiangwei Guo ⁶, Benjamin Gregory ¹, Peter Meisenheimer ⁴, Punit Kumar ⁵, X. Lin^2,7, Morgan Congdon ^1,8, Andrej Singer ¹, Z. Hong⁶, Lucas Caretta ⁹, S. Kim¹⁰, Lane W. Martin ^2,3,5,11, Paul Stevenson ¹², Yimo Han ^2,3, Z. Yao ⁵, Ramamoorthy Ramesh ^2,3,4,5,11, Darrell G. Schlom ^1,14,15

Author affiliations:
¹:Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA
²:Department of Materials Science and NanoEngineering, Rice University, Houston, TX 77005, United States
³:Rice Advanced Materials Institute, Rice University, Houston, TX 77005, United States
⁴:Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
⁵:Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
⁶:School of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang, 310058, China
⁷:School of Physics, Nanjing University, Nanjing, Jiangsu, 210093, China
⁸:Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM), Cornell University, Ithaca, NY, 14853 USA
⁹:School of Engineering, Brown University, Providence, RI 02912, USA
¹⁰:Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
¹¹:Departments of Chemistry and Physics and Astronomy, Rice University, Houston, TX, 77005, USA
¹²:Department of Physics, Northeastern University, Boston, MA 02115, USA
¹³:Department of Physics, University of California, Berkeley, CA, 94720, USA
¹⁴:Kavli Institute for Nanoscale Science, Cornell University, Ithaca, NY 14853, USA
¹⁵:Leibniz-Institut für Kristallzüchtung, 12489 Berlin, Germany

Here we present the growth and characterization data of BiFeO3 samples grown on TbScO3 (110) substrates for thicknesses ranging from 5 nm to 100 nm. Included in this DOI are the growth conditions, including substrate temperature, oxidant pressure, and shutter status in the data attached below for the samples used in this study. In addition, raw atomic force microscopy, piezoforce microscopy, and x-ray diffraction data has been added.