Dataset: Improper Ferroelectricity at the Monolayer Limit

Authors: Yilin Evan Li ^1*, Harikrishnan KP ^2*, Haidong Lu ^3*, Rachel A. Steinhardt ^1,14*, Megan E. Holtz ^1,2,15*, Mario Brützam⁴, Matthew M. Dykes ⁵, Elke Arenholz ⁶, Sankalpa Hazra ⁷, Adriana LaVopa ^1,16, Xiaoxi Huang ⁵, Wenwen Zhao ², Piush Behera ⁸, Maya Ramesh ¹, Evan Krysko ¹, Venkatraman Gopalan ^7,9, Ramamoorthy Ramesh ^10,11, Craig J. Fennie ², Robert J. Cava ¹³, Christo Guguschev ⁴, Alexei Gruverman ³, David A. Muller ^2,12, Darrell G. Schlom ^1,4,12

Author affiliations:
¹:Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
²:School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.
³:Department of Physics and Astronomy, University of Nebraska, Lincoln, NE, USA.
⁴:Leibniz-Institut für Kristallzüchtung, Berlin, Germany.
⁵:Department of Physics, Cornell University, Ithaca, NY, USA.
⁶:Physical Sciences Division, Pacific Northwest National Laboratory, Richland, WA, USA.
⁷:Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA,USA.
⁸:Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, USA.
⁹:Department of Physics, The Pennsylvania State University, University Park, PA, USA.
¹⁰:Department of Materials Science and Nanoengineering, Rice University, Houston, TX, USA.
¹¹:Department of Physics and Astronomy, Rice University, Houston, TX, USA.
¹²:Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, USA.
¹³:Department of Chemistry, Princeton University, Princeton, NJ, USA.
¹⁴:Present address: Components Research, Intel Corporation, Hillsboro, OR, USA.
¹⁵:Present address: Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden,CO, USA.
¹⁶:Present address: Department of Materials Science and Engineering, University of Florida, Gainesville, FL,USA.

^*These authors contributed equally to this work.

This dataset includes the raw data for all figures in the paper, as well as the MBE growth log file detailing the deposition parameters and conditions used for sample preparation.