Dataset: Synthesis of thin film infinite-layer nickelates by atomic hydrogen reduction: clarifying the role of the capping layer

Authors: C. T. Parzyck ¹, V. Anil ¹, Y. Wu¹, B.H. Goodge ^2,3, M. Rodd¹, L. F. Kourkoutis ^2,3, D. G. Schlom ^3,4,5, K. M. Shen^1,3,6

Author affiliations:
¹:Laboratory of Atomic and Solid State Physics, Department of Physics, Cornell University, Ithaca, NY 14853, USA
²:School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA
³:Kavli Institute at Cornell for Nanoscale Science, Cornell University, Ithaca, NY 14853, USA
⁴:Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA
⁵:Leibniz-Institut für Kristallzüchtung, Max-Born-Straße 2, 12489 Berlin, Germany
⁶:Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Campus UAB Bellaterra 08193, Spain

This dataset includes system parameters used during the molecular-beam epitaxy growth of the perovskite nickelate, NdNiO₃, as well as characterization of the resulting thin films both before and after their reduction to the infinite-layer phase, NdNiO₂. Structural and morphological characterization is performed using reflection high-energy electron diffraction, lab-based x-ray diffraction, transmission electron microscopy, and atomic force microscopy. Electrical properties are assessed by temperature dependent resistivity and temperature dependent hall effect measurements.

This dataset is cited by: https://doi.org/10.1063/5.0197304